Annealsys manufactures Rapid Thermal Processing and Chemical Vapor Deposition systems for R&D and production. Process service is also available.
RTP / RTPCVD systems with vacuum and high temperature capability up to 2000°C. Pulse annealing for processing thermally sensitive substrates. Possibility to perform some ALD processes in the RTP machines. Applications: contact annealing, oxidation, CVD of graphene and h-BN, selenization, silicon carbide implant annealing, ALD of Al2O3 and ZnO.
DLI-CVD / DLI-ALD systems with direct liquid injection (DLI) vaporizers for deposition of materials using the widest range of organometallic precursors. Multi process capability 2-inch system: DLI-CVD, DLI-ALD and RTP inside the same chamber. Applications: multi-metallic oxides, metals, nitrides, 2D materials.
139 rue des Walkyries
Phone: +33 467 20 23 63