SENTECH Instruments develops, manufactures, and globally sells innovative capital equipment centered on thin films in semiconductor technology, microsystems, photovoltaics, nanotechnology and materials research. SENTECH is expert in structuring and deposition of thin films by means of plasma process technology. SENTECH offers systems for plasma etching, plasma enhanced chemical vapour deposition, and atomic layer deposition. SENTECH provides innovative solutions for non-contact, non-invasive optical characterization using ellipsometry and reflectometry.
Founded in 1990, SENTECH is a reliable partner to industry and scientific institutions with leading edge equipment, global sales and service network.
The SENTECH motto “Erfolg durch Leistung” is a continuing commitment of all employees to achieve success by high standard of efficiency and customer service.
Plasma process technology
Inductively Coupled Plasma (ICP) etch of silicon, quartz, and dielectrics
Plasma Etch using Capacitively Coupled Plasma (CCP) sources
Deep Reactive Ion Etching (DRIE)
Inductively Coupled Plasma Enhanced Chemical Vapour Deposition (ICPECVD)
Thermal and Plasma Enhanced Atomic Layer Deposition (PEALD)
Thin Film Metrology: