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Thin Film, Flexible and Composite Materials and their Formation Techniques
MNext-generation thin films: innovations in PVD and CVD techniques
Next-generation thin films are revolutionizing functional materials, with advancements in both Physical and Chemical Vapor Deposition techniques. This symposium explores innovations in PVD and CVD, focusing on their impact on material performance, properties, and applications.
Scope:
This symposium will delve into the advancements in Physical Vapor Deposition (PVD) and Chemical Vapor Deposition (CVD), exploring their roles in the synthesis of next-generation functional materials. The goal is to provide a comprehensive comparison of PVD and CVD processes, focusing on their fundamental differences, advantages, limitations, and specific applications in modern material science.
PVD techniques, such as sputtering pulsed laser depositions and electron-beam evaporation, rely on physical processes to deposit thin films with complex compositions, offering precision in thickness control and high purity. These methods are widely used in microelectronics, optics, and hard coatings. On the other hand, CVD techniques—including thermal CVD, plasma-enhanced CVD (PECVD), and atomic layer deposition (ALD)—rely on chemical reactions to form films and are known for their superior conformality and ability to deposit films over complex geometries. This versatility makes CVD crucial for applications like semiconductor manufacturing, energy storage devices, and catalysis. By discussing the technological advancements in each technique, such as the development of high-power impulse magnetron sputtering (HiPIMS) in PVD or the rise of plasma-enhanced and low-temperature CVD processes, this symposium aims to highlight the unique advantages that each deposition method offers for material synthesis. Additionally, we will explore the emerging trends in these fields, such as hybrid techniques, and the tailoring of material properties through precise process control, which could further push the boundaries of thin-film applications. Researchers, engineers, and industry professionals are invited to share their insights and experiences, fostering a deeper understanding of how PVD and CVD continue to shape the future of functional materials.
Hot topics to be covered by the symposium:
- Fundamentals and modelling of physical and chemical vapor-based thin-film synthesis
- Thin-film growth dynamics and atomic-scale processes
- Computational driven design of thin films
- Vapor-based synthesis of metastable alloys, self-organized nanostructures, high-entropy alloys, and metallic glasses
- Hybrid PVD/CVD techniques for enhanced material performance
- Atomic Layer Deposition (ALD) vs. Molecular Layer Deposition (MLD) in functional coatings
- Thin films and coatings for energy applications.
- Thin films and coatings for wear, corrosion, and radiation resistance
- Thin films and coatings for photonic, microelectronic, optical devices, catalytic and sensing applications
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Helsinki Accelerator Laboratory, Department of Physics, P.O. Box 43, FI-00014 Helsinki, Finland
kostas.sarakinos@helsinki.fi41 rue de Brill, Esch sur Alzette-Belvaux, L 4422, Luxembourg
petru.luncapopa@list.lu126A, Erou Iancu Nicolae Street, 077190, Voluntari, Ilfov, Romania
rodica.plugaru@imt.roIPCMS, 23 rue du Loess, F-67034 Strasbourg Cedex 2, France
silviu.colis@ipcms.unistra.fr