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Innovative and advanced epitaxy

The symposium takes an interdisciplinary and cross-community approach to key problems in epitaxy, including breakthroughs in challenging materials systems, new experimental and theoretical methods for the maturation of epitaxial materials, and novel functionalities for next-generation devices.


Today, material innovation is more vital than ever and needs to be not only more efficient and design-driven but also environment friendly as well as energy- and resource saving. The European epitaxy community is now at a turning point. Global challenges such as sustainability, information security, Smart Cities and the Internet of Things demand new technologies which can be enabled by advanced epitaxial materials. However, there are significant roadblocks to continued innovation in epitaxial materials, and these barriers are common across the wide range of maturity of the different materials classes:

  • a deep understanding of the basic processes allowing control of their synthesis and properties;
  • the development of hybrid material systems integrating multiple functionalities;
  • the material engineering to target specific properties in relation with identified applications;
  • the conversion of the scientific excellence into innovative solutions to establish disruptive technologies.

These topics, common to a large variety of epitaxial materials, whatever their form and synthesis techniques, constitute the essential prerequisites for their successful deployment into applications. In relationship with the EU COST Action OPERA, the symposium aims at bringing together scientists working in the field of epitaxy and push the merger of researchers 1) from traditionally separated scientific communities but having complementary knowledge and common interest, and 2) from academia and industry. It focuses therefore on innovative and advanced epitaxy, with the main objective to share ground-breaking theoretical or experimental researches on epitaxial materials, properties and devices, whatever the materials (III-V, III-N, group-IV, functional oxides, 2D-materials, novel metal or semi-metal compounds, dielectrics), their dimension (bulk, 2D-layer, 3D-shape, structured at micro- or nano-scales) and their growth technique (MBE, (MO)CVD, ALD, LPE, PLD...). New epitaxial combinations of materials will be highlighted, then opening the way towards next generation multi-functional devices.

Hot topics to be covered by the symposium:

  • Epitaxy of new materials: 2D-materials going beyond graphene, new alloys and compounds, oxides and free-standing oxide membranes, semi-metals and topological materials compatible with Si-based technology;
  • Epitaxy of new functional materials: hyperbolic materials, high Χ2 non linear materials, dielectric constant engineered materials, high-mobility materials, 2D/0D quantum-confined systems ...
  • Epitaxy of hybrid systems, combining materials with different properties: III-V/Si, oxides/Si or III-V, 2D/III-V or Si, III-V/metals or semimetals and oxide heterostructures;
  • New approaches of epitaxy in theory and experiment;
  • Epitaxy of innovative monolithic devices

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Symposium organizers
Achim TRAMPERTPaul-Drude-Institut für Festkörperelektronik

Hausvogteiplatz 5–7, 10117 Berlin, Germany

+49 30 20377 280
Charles CORNETFOTON laboratory – INSA Rennes

INSA Rennes, 20, Avenue des Buttes de Coësmes, CS 70839, F-35708 Rennes Cedex 7, France

+33 (0)2 23 23 83 99
Frédéric LEROYAix-Marseille Université

CINaM - Campus de Luminy - Case 913 - 13288 Marseille Cedex 9, France

+33 (0)660362824
Gavin BELLUniversity of Warwick

Department of Physics, Coventry CV4 7AL, UK

+44 24 7652 3489