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Thin films: from growth to processing and applications
CSynthesis, processing and characterization of nanoscale multi functional oxide films X and 10th E-MRS & MRS-J bilateral symposium
Oxide thin films are pivotal in numerous technologies and devices, enabling the integration of multiple functions within heterostructures. Advancements in the synthesis, characterization, and application of nanoscale multifunctional oxide films are crucial for developing high-performance, eco-friendly electronics, sensors, and energy devices.
Scope:
As silicon technology faces fundamental atomic barriers and the decline of Moore's Law, the imperative to find alternative materials for future technological progress grows. Oxideheterostructures are increasingly recognized for their multifunctional capabilities and sustainability potential, positioning them as strong contenders to replace silicon CMOS technology. Realizing this potential in high-performance oxide devices demands mastering atomistic-level thin film growth, employing sophisticated characterization techniques, and leveraging advanced modeling and theory. Crucially, a multiscale understanding of how strain, interfaces, defects, and composition dictate material properties is needed for effective tuning. The unique properties emerging at interfaces—whether oxide-oxide or oxide-other material—also offer significant opportunities.
Furthermore, addressing practical application requirements, such as cost-effective, low-temperature deposition and integration with diverse substrates (e.g., semiconducting wafers, flexible materials), is essential for widespread adoption. In this 10th edition of the “Synthesis, Processing and Characterization of Nanoscale Multi Functional Oxide Films" symposium, all of the tunable properties of oxides will be considered, among which we mention ferroelectricity, ferromagnetism, electronic and optic properties, thermoelectricity, superconductivity, field effect tunability, carrier mobility, photoconductivity, low dimensionality, catalytic and photovoltaic behavior. This symposium follows a series of eight very successful and well attended E-MRS symposia organized from 2006 to 2023. The symposium intends to continue the established tradition of an interdisciplinary and multidisciplinary forum that will bring together scientists and engineers involved in various aspects of the synthesis, processing, characterization, device integration and theoretical modeling of multi-functional oxide-based thin films, multilayers and nanostructures to discuss the latest developments and future trends and challenges.
Hot topics to be covered by the symposium:
- New deposition methods: chemical methods involving biodegradable precursors, low temperature process (ALD, 2D nanosheets by Langmuir process…) ; low cost methods
- Atomic control of films and heterostructures
- New deposition methods suitable to control the microstructure of thin films on alternative substrates
- Development of alternative substrates (flexible, low costs...)
- Lead free piezoelectric, toxic free composition functional materials
- Substitution or reduction of critical raw elements in oxides
- Oxide thin films for renewable energy: photovoltaics, photocatalysis, thermoelectrics, piezo-generators …
- Strain and curvature control in oxide membranes and nanowires
- Low-dimensional oxide systems
- Solid state ionics for energy and sensing
- New trends and applications in transparent conducting oxides
- Magnetoelectric, spintronic and spin-orbitronic oxide devices
- Real time and operando characterizations of film growth and functional properties
- Advanced characterization by microscopies or spectroscopic techniques of oxide thin films
- Growth and properties of complex heterostructures, including superlattices
- Epitaxial stabilization of unstable oxide phases
- Defects in oxide thin films
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930 Nishi-Mitani, Kinokawa, Wakayama 6496493, Japan
nishik32@waka.kindai.ac.jpLee Maltings, Dyke Parade, Cork, Ireland
mircea.modreanu@tyndall.ie7-24-1 Narashinodai, Funabashi-shi Chiba, 274-8501, Japan
iwata.nobuyuki@nihon-u.ac.jp185 Miyanokuchi, Tosayamada-cho, Kami-shi, Kochi 782-8502, Japan
yamamoto.tetsuya@kochi-tech.ac.jp409 Atomistilor, Magurele, Ilfov, Romania
valentin.craciun@inflpr.roCampus de Beaulieu, Bâtiment 10A, Bureau 41/1, porte A06263, Avenue du Général Leclerc - 35042 Rennes Cedex, France
valerie.demange@univ-rennes.fr