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MATERIAL PROCESSING AND CHARACTERIZATION

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Current trends in optical and X-ray metrology of advanced materials for nanoscale devices V

Photonic probes are an essential tool to characterize novel materials, since they can be non-destructive and are sensitive to many of the critical characteristics of the materials.  This symposium will explore the use of photons from terahertz to x-ray to characterize materials essential for many emerging technologies.

Scope:

This symposium will explore recent advances in photonic characterization of novel materials used in applications as varied as renewable energy, medical applications, and art restoration.  Visible photons are very easy to produce and manipulate, and have the proper energy to characterize semiconductor materials, such as might be found in solar cells.  Infrared and terahertz photons much lower energy and are harder to produce and manipulate, but give information about lattice vibrations and impurities in materials. X-rays are much higher energy, and therefore can explore material characteristics such as lattice spacing and atom identification.  This international symposium is intended to give an overview of the current status and future trends of optical, terahertz, infrared and x-ray metrology used to characterize nanoscale and other materials essential for many emerging technologies.  Particular attention will be placed on materials essential for renewable energy and health applications, particularly ellipsometric characterization of solar cells. In addition, the optical and x-ray techniques used as analytical tools to study art and other cultural artifacts will be explored, with a particular emphasis on the understanding of the mechanisms of aging and stabilization. Another emphasis of the symposium will be on us use of larger facilities, such as synchrotrons, which produce x-rays with characteristics beyond the capability of laboratory light sources.  An important consideration in this symposium will be on the actual characteristics measured, as well as the limits of the technique.

In addition to the scientific objectives, we will promote and encourage the interaction between worldwide scientists, particularly from Europe, USA and Asia now working in these fields.   Interactions between academics, national lab scientists and instrument manufacturers will be encouraged to improve standard analytical methods and qualification of newer techniques suitable for addressing the needs for the emerging technologies of the future.

Hot topics to be covered by the symposium:

  • Ellipsometric techniques (Mueller Matrix, Infrared, THz, time-resolved)
  • X-ray diffuse scattering
  • Ellipsometric and other studies of photovoltaic materials
  • X-ray synchrotron sources and techniques developed to explore thin-layered materials of micron dimensions as well as single crystals.
  • Spatially resolved optical and x-ray techniques.
  • Characterization of complex materials such as graphene, graphene oxide, Hybrid perovskites, 2D semiconductor materials, nanotubes and nanowires, nanoporous materials and composites.
  • Characterisation of new or advanced concepts of solar cells.
  • Nanostructures, photonic crystals, and metamaterials; plasmons at interfaces and in nanostructured materials.
  • Dielectrics and ceramics: low- and high-k materials; transparent semiconductors, ferroelectrics, ferromagnetics

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Symposium organizers
Gerald E. JELLISONMaterials Science and Technology Division - Oak Ridge National Laboratory

1 Bethel Valley Road Oak Ridge, TN 37831 USA

+865 576 7309
jellisongejr@ornl.gov
Hiroyuki FUJIWARAGifu University, Japan

1-1 Yanagido, Gifu, Gifu Prefecture 501-1193, Japan

fujiwara@gifu-u.ac.jp
Mircea MODREANUTyndall National Institute-University College Cork

Lee Maltings, Dyke Parade, Cork, Ireland

+353 21 4904267
mircea.modreanu@tyndall.ie
Olivier DURANDUniversité Européenne de Bretagne - FOTON-OHM - UMR-CNRS 6082

INSA de Rennes, 20, avenue des Buttes de Coësmes - CS 70 839, 35708 Rennes, France

+33 (0) 2 23 23 86 28
olivier.durand@insa-rennes.fr